DocumentCode :
1243155
Title :
Improvement in the Light Output Power of GaN-Based Light-Emitting Diodes by Natural-Cluster Silicon Dioxide Nanoparticles as the Current-Blocking Layer
Author :
Tsai, Chun-Fu ; Su, Yan-Kuin ; Lin, Chun-Liang
Author_Institution :
Dept. of Electr. Eng., Nat. Cheng-Kung Univ., Tainan, Taiwan
Volume :
21
Issue :
14
fYear :
2009
fDate :
7/15/2009 12:00:00 AM
Firstpage :
996
Lastpage :
998
Abstract :
In this study, the fabrication and characterization of InGaN-GaN multiple-quantum-well light-emitting diodes (LEDs) with silicon dioxide (SiO2) nanoparticles as the current-blocking layer (CBL) are described. The performance was improved by introducing SiO2 nanoparticles, not deposited by commonly used plasma-enhanced chemical vapor deposition, as the CBL beneath the p-pad. The injected current was forced to spread outside instead of flowing directly downward. At 20 mA, the light output power of the LED with a CBL was increased 15.7% as compared to that of the conventional LED. The forward voltage of the LED with the SiO2 nanoparticle CBL was 3.34 V at 20 mA, which was slightly higher than that of the conventional LED (3.29 V). The increase in the light output power can be attributed to the injection of additional current into the light-emitting active layer of the LED by the SiO2 nanoparticles CBL and thus a reduction in optical absorption at the p-pad.
Keywords :
III-V semiconductors; gallium compounds; indium compounds; light emitting diodes; nanoparticles; quantum well devices; semiconductor quantum wells; silicon compounds; wide band gap semiconductors; InGaN-GaN-SiO2; LED; current 20 mA; current-blocking layer; forward voltage; light output power; multiple-quantum-well light-emitting diodes; natural-cluster silicon dioxide nanoparticles; optical absorption; p-pad; plasma-enhanced chemical vapor deposition; voltage 3.34 V; Current-blocking layer (CBL); GaN-based light-emitting diodes (LEDs); silicon dioxide ($hbox{SiO}_{2}$ ) nanoparticles;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2009.2020177
Filename :
4815521
Link To Document :
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