DocumentCode
1244202
Title
Effects of RF and DC stress on AlGaN/GaN MODFETs: a low-frequency noise-based investigation
Author
Valizadeh, Pouya ; Pavlidis, Dimitris
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., Univ. of Michigan, Ann Arbor, MI, USA
Volume
5
Issue
3
fYear
2005
Firstpage
555
Lastpage
563
Abstract
The impact of radio frequency (RF) and DC stress on passivated and unpassivated AlGaN/GaN modulation-doped field effect transistors (MODFETs) is investigated by means of DC and low-frequency noise (LFN) measurements. Unpassivated devices endure significant changes in the output resistance, gate, and drain noise current level after RF and DC stress. RF and DC stress of unpassivated devices leads to different degradation time constant and gate noise current. Besides, a positive shift in the pinch-off voltage is found to take place only after RF stress. In contrast to unpassivated devices, passivated devices do not show any considerable variation in the output resistance and gate, and drain noise current characteristics upon RF or DC stress. However, a positive shift in the pinch-off voltage upon RF stress is observed for both types of devices.
Keywords
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; noise measurement; semiconductor device measurement; wide band gap semiconductors; AlGaN-GaN; DC measurement; DC stress; MODFET; RF stress; current degradation; low frequency noise measurement; modulation doped field effect transistors; passivated devices; unpassivated device; Aluminum gallium nitride; Electrical resistance measurement; Frequency measurement; Gallium nitride; HEMTs; Low-frequency noise; MODFETs; Radio frequency; Stress; Voltage; Current degradation; DC stress; MODFET; RF stress; low-frequency noise;
fLanguage
English
Journal_Title
Device and Materials Reliability, IEEE Transactions on
Publisher
ieee
ISSN
1530-4388
Type
jour
DOI
10.1109/TDMR.2005.853515
Filename
1545919
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