• DocumentCode
    1245062
  • Title

    A novel GaAs power MESFET with low distortion characteristics employing semi-insulating setback layer under the gate

  • Author

    Furukawa, Hidetosihi ; Tateoka, Kazuki ; Miyatsuji, Kazuo ; Sugimura, Akihisa ; Ueda, Daisuke

  • Author_Institution
    Electron. Res. Lab., Matsushita Electron. Corp., Osaka, Japan
  • Volume
    43
  • Issue
    2
  • fYear
    1996
  • fDate
    2/1/1996 12:00:00 AM
  • Firstpage
    193
  • Lastpage
    200
  • Abstract
    A low distortion GaAs power MESFET has been developed by employing a semi-insulating setback layer under the gate. The setback region was obtained by diffusing chromium from the Cr/Pt/Au gate metal in self-aligned manner. The novel power FET with the setback layer was found to be insensitive to surface trapping effects. They showed only 5-6 percent frequency dispersion of drain current at 1 MHz compared to DC condition. Because of this small frequency dispersion, the typical measurement FET, which has a surface setback layer, with a gate width of 36 mm exhibited 1.5 dB larger output power at 1 dB gain compression point than that of the FET without the setback layer. Moreover, in the π/4 shift-QPSK modulation that has been most popular in digital mobile communication system, the FET exhibited 11 dB smaller adjacent channel leakage power than the conventional one at the output power of 31.5 dBm
  • Keywords
    III-V semiconductors; characteristics measurement; chromium; diffusion; electric distortion; gallium arsenide; gold; mobile communication; platinum; power MESFET; quadrature phase shift keying; 1 MHz; 36 mm; Cr-Pt-Au-GaAs; QPSK modulation; adjacent channel leakage power; digital mobile communication system; distortion characteristics; frequency dispersion; gain compression point; gate width; power MESFET; self-aligned diffusion; semi-insulating setback layer; Chromium; Dispersion; FETs; Frequency measurement; Gain measurement; Gallium arsenide; Gold; MESFETs; Power generation; Power measurement;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.481717
  • Filename
    481717