DocumentCode :
1245133
Title :
Quasi-three-dimensional modeling of a novel 2-D MESFET
Author :
Hurt, M.J. ; Shur, M.S. ; Peatman, W.C.B. ; Rabkin, P.B.
Author_Institution :
Dept. of Electr. Eng., Virginia Univ., Charlottesville, VA, USA
Volume :
43
Issue :
2
fYear :
1996
fDate :
2/1/1996 12:00:00 AM
Firstpage :
358
Lastpage :
359
Abstract :
We present a quasi-three-dimensional method for modeling novel semiconductor devices. The first step of our method is a two-dimensional numerical simulation of the device cross-section under different gate biases. Next, we use the interpolated results of the two-dimensional numerical simulation as input to the analytical theory describing the potential distribution and current in the third dimension. As an example, this method is applied to a novel two-dimensional AlGaAs/InGaAs Metal-Semiconductor Field Effect Transistor (2D MESFET)
Keywords :
III-V semiconductors; Schottky gate field effect transistors; aluminium compounds; gallium arsenide; indium compounds; semiconductor device models; 2D MESFET; AlGaAs-InGaAs; current; interpolation; potential distribution; quasi-three-dimensional modeling; semiconductor device; two-dimensional numerical simulation; CMOS technology; Capacitance; FETs; Gallium arsenide; MESFETs; Modems; Numerical simulation; Semiconductor device modeling; Semiconductor devices; Thin film transistors;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.481740
Filename :
481740
Link To Document :
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