DocumentCode :
1245138
Title :
A brief analysis of the field effect diode and breakdown transistor
Author :
Raissi, Farshid
Author_Institution :
Dept. of Electr. & Comput Eng., Wisconsin Univ., Madison, WI, USA
Volume :
43
Issue :
2
fYear :
1996
fDate :
2/1/1996 12:00:00 AM
Firstpage :
362
Lastpage :
365
Abstract :
The carrier densities of a field effect diode are calculated for the limit of a thin intrinsic silicon layer. The resulting current-voltage relation and the application of this device as a transistor are discussed. In forward bias, carrier densities can be modulated without the complications of the hot-electron effects present in regular field effect transistors. In reverse bias, it can be utilized as a transistor in which the breakdown voltage is modulated by the gate voltages
Keywords :
carrier density; field effect devices; field effect transistors; semiconductor diodes; Si; breakdown transistor; carrier densities; current-voltage relation; field effect diode; field effect transistor; CMOS technology; Charge carrier density; Charge carrier processes; Conductive films; Electric breakdown; Equations; FETs; Semiconductor diodes; Semiconductor films; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.481742
Filename :
481742
Link To Document :
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