DocumentCode :
1245561
Title :
A 100-MHz ultrasonic transducer array using ZnO thin films
Author :
Ito, Yukio ; Kushida, Keiko ; Sugawara, Kazuhiro ; Takeuchi, Hiroshi
Author_Institution :
Central Res. Lab., Hitachi Ltd., Tokyo, Japan
Volume :
42
Issue :
2
fYear :
1995
fDate :
3/1/1995 12:00:00 AM
Firstpage :
316
Lastpage :
324
Abstract :
A 100-MHz ultrasonic linear transducer array made from a piezoelectric zinc oxide thin film on a sapphire substrate was developed and evaluated. Epitaxial, high-acoustic quality 10-/spl mu/m-thick ZnO film layers were produced by rf-magnetron sputter deposition onto a (111)-oriented gold film (with a chromium adhesion layer) that was vacuum-evaporated onto a (0001) sapphire surface. We found that, in well-oriented growth of gold, it is important to control the chromium sublayer thickness (less than 5 nm). An array was constructed by photolithography with an appropriate etch. V-shaped grooves between adjacent elements were formed by using an anisotropic etchant (HCl and HNO/sub 3/-based) that preferentially etched the c-plane of ZnO. Typical array elements were 90 /spl mu/m wide, 3.2 mm long, and 10 /spl mu/m thick, and the pitch of an array was typically 100 /spl mu/m. Our fine uniform array resulted in uniform ultrasonic response of individual elements throughout the array. For a 32-element array, the ultrasound beam in the azimuth plane in water could be electronically focused in the 100 MHz range to obtain a half-amplitude width of 60 /spl mu/m at the focal depth, agreeing well with theoretical predictions. Besides the use demonstrated with this present transducer, piezoelectric thin films should also lead to fabrication of various other kinds of ultrasonic transducers that can operate at high frequencies and should provide opportunities for miniaturizing transducers and making integrated ultrasonic devices.<>
Keywords :
acoustic arrays; acoustic transducers; etching; photolithography; sputter deposition; ultrasonic imaging; ultrasonic materials testing; ultrasonic transducer arrays; zinc compounds; 10 micron; 100 MHz; V-shaped grooves; ZnO; ZnO thin films; anisotropic etchant; half-amplitude width; integrated ultrasonic devices; linear transducer; nondestructive testing; photolithography; rf-magnetron sputter deposition; ultrasonic transducer array; uniform ultrasonic response; Chromium; Etching; Gold; Piezoelectric films; Piezoelectric transducers; Sputtering; Transistors; Ultrasonic transducer arrays; Ultrasonic transducers; Zinc oxide;
fLanguage :
English
Journal_Title :
Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
Publisher :
ieee
ISSN :
0885-3010
Type :
jour
DOI :
10.1109/58.365245
Filename :
365245
Link To Document :
بازگشت