Title :
UV-induced index changes in Undoped Fluoride glass
Author :
Zeller, M. ; Lasser, T. ; Limberger, H.G. ; Mazé, G.
Author_Institution :
Swiss Fed. Inst. of Technol., Lausanne, Switzerland
Abstract :
Undoped fluoride glass slides have been exposed to pulsed 193-nm ultraviolet (UV) irradiation. Their absorption changes have been measured to evaluate UV-induced index changes using Kramers-Kronig relation. A layer-peeling polishing technique was applied to characterize the local UV-induced index change of highly absorbing glass. Index changes up to 1.75×10-4 have been evaluated with this method in fluorozirco-aluminate glass. Fluoroaluminate and fluorozirconate glass showed only small index changes of about 2.0×10-6 and 2.6×10-6 at a wavelength of 1550 nm.
Keywords :
Kramers-Kronig relations; aluminium compounds; fluoride glasses; optical glass; polishing; ultraviolet radiation effects; zirconium compounds; 1550 nm; 193 nm; AlF3; Kramers-Kronig relation; UV-induced index changes; ZrF4; absorption changes; fluorozirconate glass; glass slides; highly-absorbing glass; layer-peeling polishing; pulsed ultraviolet irradiation; undoped fluoride glass; Charge carrier processes; Electromagnetic wave absorption; Fiber lasers; Glass; Optical fiber sensors; Optical microscopy; Solid lasers; Stress; Tail; Waveguide lasers; Absorption; fluoride glass; photosensitivity;
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.2004.841781
