DocumentCode :
1246648
Title :
Re-engineering silicon: Si-Ge heterojunction bipolar technology
Author :
Cressler, John D.
Author_Institution :
Auburn Univ., AL, USA
Volume :
32
Issue :
3
fYear :
1995
fDate :
3/1/1995 12:00:00 AM
Firstpage :
49
Lastpage :
55
Abstract :
Thanks to refined techniques of material growth, circuits based on Si-Ge devices have made their way to market and bode especially well for wireless communications. The author reviews material properties, HBT technologies and circuit applications
Keywords :
Ge-Si alloys; bipolar integrated circuits; heterojunction bipolar transistors; semiconductor growth; semiconductor materials; HBT technologies; Si-Ge heterojunction bipolar technology; SiGe; circuit applications; high speed chips; material growth; material properties; ring oscillator; wireless communications; Capacitive sensors; Chemical vapor deposition; Cutoff frequency; Germanium silicon alloys; Heterojunctions; Lattices; Photonic band gap; Semiconductor films; Silicon germanium; Transistors;
fLanguage :
English
Journal_Title :
Spectrum, IEEE
Publisher :
ieee
ISSN :
0018-9235
Type :
jour
DOI :
10.1109/6.367973
Filename :
367973
Link To Document :
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