DocumentCode :
1247878
Title :
Conversion Efficiency Enhancement of GaN/In _{0.11} Ga _{0.89} N Solar Cells With Nano Patterne
Author :
Wang, H.W. ; Chen, H.C. ; Chang, Y.A. ; Lin, C.C. ; Han, H.W. ; Tsai, M.A. ; Kuo, H.C. ; Yu, P. ; Lin, S.H.
Author_Institution :
Dept. of Electrophys., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Volume :
23
Issue :
18
fYear :
2011
Firstpage :
1304
Lastpage :
1306
Abstract :
In this study, p-i-n double-heterojunction GaN/ In0.11Ga0.89 N solar cells grown by metal-organic chemical vapor deposition on pattern sapphire substrate are presented. The solar cell with standard process has a conversion efficiency of 3.1%, which corresponds to a fill factor of 58%, short circuit current density of 2.86 mA/cm2 , and open circuit voltage of 1.87 V under AM1.5G illumination. To further improve the conversion efficiency of the GaN/ In0.11Ga0.89 N solar cells, two-dimensional polystyrene nanospheres were deposited and self-organized as mask in the anisotropic inductively coupled plasma reactive ion etching process to form a biomimetic surface roughing texture. The surface morphology of the solar cell shows a periodically hexagonal bead pattern and the beads are formed in a diameter of 160 nm with a period of 250 nm. An increase of 15% in short circuit current density is found, thus improving the conversion efficiency to 3.87%. If we optimize the structure for 180 nm of the height and 375 nm of the period, a 10% gain can be expected when compared to the current structure.
Keywords :
III-V semiconductors; MOCVD; current density; gallium compounds; indium compounds; sapphire; solar cells; sputter etching; surface morphology; wide band gap semiconductors; Al2O3; GaN-In0.11Ga0.89N; anisotropic inductively coupled plasma reactive ion etching process; biomimetic surface antireflection process; biomimetic surface roughing texture; conversion efficiency enhancement; fill factor; metal-organic chemical vapor deposition; nanopatterned sapphire; p-i-n double-heterojunction solar cells; pattern sapphire substrate; periodically hexagonal bead pattern; short circuit current density; size 160 nm; surface morphology; two-dimensional polystyrene nanospheres; voltage 1.87 V; Epitaxial growth; Gallium nitride; Photonic band gap; Photovoltaic cells; Substrates; Surface morphology; Surface treatment; Biomimetic surface antireflection; InGaN solar cells;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2011.2160051
Filename :
5893914
Link To Document :
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