DocumentCode :
1249891
Title :
The long and short of channel length
Author :
Aghdaie, Behnam ; Sheu, Bing
Author_Institution :
Avant! Corp., USA
Volume :
15
Issue :
5
fYear :
1999
fDate :
9/1/1999 12:00:00 AM
Firstpage :
47
Lastpage :
51
Abstract :
In this article, the powerful shift-and-ratio method proposed by Taur of IBM Corp. [1992] is used to accurately determine effective channel length and mobility of deep-submicron devices. We show that the extracted low field mobility of a short-channel device as a function of gate voltage is consistent with that of a long-channel device. Since in the BSIM3v3.2 industrial standard model a universal low field mobility is used for devices of various sizes, the shift-and-ratio method is particularly suitable for determining accurate effective channel length that leads to a consistent mobility value
Keywords :
MOSFET; carrier mobility; semiconductor device models; BSIM3v3.2 industrial standard model; MOSFET; deep-submicron devices; effective channel length; extracted low field mobility; gate voltage; shift-and-ratio method; short-channel device; Artificial intelligence; Capacitance; Circuit simulation; Computational modeling; Etching; MOS devices; Page description languages; Refining; Voltage;
fLanguage :
English
Journal_Title :
Circuits and Devices Magazine, IEEE
Publisher :
ieee
ISSN :
8755-3996
Type :
jour
DOI :
10.1109/101.795092
Filename :
795092
Link To Document :
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