Title :
AlGaN/GaN double heterostructure channel modulation doped field effect transistors (MODFETs)
Author :
Zhifang Fan ; Changzhi Lu ; Botchkarev, A.E. ; Tang, Hongying ; Salvador, Arley ; Aktas, Ozgur ; Kim, Wonhee ; Morkoc, H.
Author_Institution :
Mater. Res. Lab., Illinois Univ., Urbana, IL
fDate :
4/24/1997 12:00:00 AM
Abstract :
AlGaN/GaN double heterostructure channel modulation doped field effect-transistors (DHCMODFETs) with a 1.5-1.75 μm gate length and 3 μm channel length exhibiting record transconductances and saturation current have been demonstrated. The maximum normalised drain current and transconductance are ~1100 mA/mm and 270 mS/mm, respectively, at room temperature. Near pinch-off, the drain breakdown voltage is ~80 V. At an elevated temperature of 300°C, the maximum drain source current and extrinsic transconductance of the device are ~500 mA/mm and 120 mS/mm, respectively
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; 300 C; AlGaN-GaN; AlGaN/GaN double heterostructure channel MODFET; drain breakdown voltage; drain current; saturation current; transconductance;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19970497