DocumentCode :
1250419
Title :
Rectifying characteristics of thin film self-switching devices with ZnO deposited by atomic layer deposition
Author :
Soga, I. ; Komuro, Atsushi ; Tsuboi, O.
Author_Institution :
Fujitsu Labs., Atsugi, Japan
Volume :
48
Issue :
15
fYear :
2012
Firstpage :
914
Lastpage :
916
Abstract :
To realise a rectifying device utilising ZnO, self-switching devices (SSDs) have been fabricated using ZnO thin films. The SSDs do not require a p-type doping junction or a Schottky barrier. At first, normally-off ZnO thin film transistors were fabricated, which exhibited control of threshold voltage by the channel length. Thin film SSDs using a thin film transistor structure were successfully fabricated by connecting the gate electrode with the source electrode. Finally, half-wave rectification using thin film SSDs is demonstrated, which reveals the possibility of ZnO thin film SSDs for power supply.
Keywords :
II-VI semiconductors; atomic layer deposition; rectification; thin film transistors; zinc compounds; Schottky barrier; ZnO deposition; atomic layer deposition; gate electrode; half-wave rectification; p-type doping junction; rectifying characteristics; rectifying device; source electrode; thin film self-switching devices; thin film transistors;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el.2012.1073
Filename :
6248333
Link To Document :
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