DocumentCode :
1250460
Title :
Effects of channel width and parasitic bipolar action on p-type poly-Si resistor characteristics
Author :
Rodder, Mark
Author_Institution :
Texas Instrum. Inc., Dallas, TX, USA
Volume :
12
Issue :
5
fYear :
1991
fDate :
5/1/1991 12:00:00 AM
Firstpage :
241
Lastpage :
243
Abstract :
The effects of channel width on I-V characteristics of thin-film p-type poly-Si resistors are discussed, in particular for the case in which the resistor current is mainly due to field-enhanced generation of carriers at the drain end (as can be common at high drain electric field). A significant decrease in current per unit width (microamperes per micrometer) is observed as the channel width is reduced from 3 to 0.6 mu m. This decrease in current per unit width is due to the influence of fixed positive charge along the channel edges, which decreases the beta value associated with parasitic bipolar action in this regime of device operation.<>
Keywords :
elemental semiconductors; silicon; thin film resistors; 3 to 0.6 micron; I-V characteristics; effects of channel width; field-enhanced generation of carriers; high drain electric field; influence of fixed positive charge; p-type resistors; parasitic bipolar action; polycrystalline Si resistors; submicron width resistors; Annealing; Character generation; Fabrication; Resistors; Semiconductor films; Silicon; Sputtering; Temperature; Thin film circuits; Thin film devices;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.79570
Filename :
79570
Link To Document :
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