DocumentCode :
1250909
Title :
Read-Preferred SRAM Cell With Write-Assist Circuit Using Back-Gate ETSOI Transistors in 22-nm Technology
Author :
Yang, Younghwi ; Jeong, Hanwool ; Yang, Frank ; Wang, Joseph ; Yeap, Geoffrey ; Jung, Seong-Ook
Author_Institution :
Sch. of Electr. & Electron. Eng., Yonsei Univ., Seoul, South Korea
Volume :
59
Issue :
10
fYear :
2012
Firstpage :
2575
Lastpage :
2581
Abstract :
The degradation of the read stability and write ability of static random-access memory (SRAM) is becoming a critical problem in deep submicrometer technology. To solve this problem, there are many SRAM cell design options such as preferred cells and assist circuits. In addition, extremely thin silicon-on-insulator (ETSOI) with a buried oxide offers an independent back-gate control. In this paper, previously proposed SRAM back-gate-assist circuit schemes are analyzed. From this, we propose a read-preferred SRAM cell with a write-assist circuit using the back-gate ETSOI. The proposed write-assist circuit minimizes the dynamic power overhead and satisfies a sufficient cell sigma in all cells during the read and write operations.
Keywords :
SRAM chips; silicon-on-insulator; back-gate ETSOI transistors; back-gate-assist circuit schemes; buried oxide; cell sigma; deep submicrometer technology; dynamic power overhead minimization; extremely thin silicon-on-insulator; independent back-gate control; read stability; read-preferred SRAM cell; size 22 nm; static random-access memory; write ability; write-assist circuit; Circuit stability; Computer architecture; Leakage current; Microprocessors; Random access memory; Stability analysis; Transistors; Assist circuit; back gate; extremely thin silicon-on-insulator (ETSOI); preferred cell; stability; static random-access memory (SRAM); write ability;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2012.2205693
Filename :
6248688
Link To Document :
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