• DocumentCode
    1252331
  • Title

    High frequency GaInP/GaAs heterostructure-emitter bipolar transistor with low offset voltage

  • Author

    Hai-Jiang Ou ; Yue-Fei Yang ; Yang, E.S.

  • Author_Institution
    Dept. of Electr. Eng., Columbia Univ., New York, NY
  • Volume
    33
  • Issue
    8
  • fYear
    1997
  • fDate
    4/10/1997 12:00:00 AM
  • Firstpage
    714
  • Lastpage
    716
  • Abstract
    A carbon doped GaInP/GaAs heterostructure-emitter bipolar transistor (HEBT) grown by MOCVD is reported with high RF performance. A cutoff frequency of 50 GHz and maximum oscillation frequency of 90 GHz were obtained for the device. An offset voltage as low as 90 mV was achieved. It is shown that the GaInP/GaAs HEBT with a high frequency and a low offset voltage is a good candidate for low battery power device applications
  • Keywords
    III-V semiconductors; chemical vapour deposition; gallium arsenide; gallium compounds; indium compounds; microwave bipolar transistors; p-n heterojunctions; 50 GHz; 90 GHz; 90 mV; GaInP-GaAs; MOCVD; RF performance; cutoff frequency; heterostructure-emitter bipolar transistor; low battery power device applications; maximum oscillation frequency; offset voltage;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19970485
  • Filename
    591121