• DocumentCode
    1253575
  • Title

    Nonmonotonic spatial decay and shield height effects in inductively coupled plasmas

  • Author

    Dai, Fa Foster ; Wu, Chwan-Hwa John

  • Author_Institution
    Dept. of Electr. Eng., Auburn Univ., AL, USA
  • Volume
    25
  • Issue
    6
  • fYear
    1997
  • fDate
    12/1/1997 12:00:00 AM
  • Firstpage
    1373
  • Lastpage
    1381
  • Abstract
    Nonmonotonic spatial decay in electric field and space current distributions was recently observed in weakly collisional plasmas. The anomalous skin effect is found to be responsible for this phenomenon. Based on our proposed self-consistent analytic model, we successfully modeled the nonmonotonic spatial decay effect in inductively coupled plasma sources. The simulated spatial distribution of the induced E-field is compared to the measurements for different applied RF powers. Quantitative agreements for the electric field and qualitative agreement for the induced space current are achieved between the simulated and measured data. Also demonstrated is that the RF power and the reactor geometry such as the shield height has a direct impact upon the anomalous skin effect and its skin depth
  • Keywords
    anomalous skin effect; high-frequency discharges; plasma collision processes; plasma production; plasma simulation; anomalous skin effect; applied RF power; electric field distribution; induced E-field; induced space current; inductively coupled plasmas; nonmonotonic spatial decay; nonmonotonic spatial decay effect; plasma sources; reactor geometry; self-consistent analytic model; shield height effects; simulation; skin depth; space current distribution; weakly collisional plasmas; Coupled mode analysis; Current distribution; Current measurement; Electric variables measurement; Inductors; Plasma measurements; Plasma simulation; Plasma sources; Radio frequency; Skin effect;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.650906
  • Filename
    650906