Fabrication of light-turning mirrors in buried-channel silica waveguides for monolithic and hybrid integration

Author

Bazylenko, M.V. ; Gross, M. ; Gauja, E. ; Chu, Pak L.

Author_Institution

Sch. of Electr. Eng., Sydney Univ., NSW, Australia

Volume

15

Issue

1

fYear

1997

fDate

1/1/1997 12:00:00 AM

Firstpage

148

Lastpage

153

Abstract

A technique for incorporating a mirror into the core of a silica-based channel waveguide is described. Both up reflecting mirrors for hybrid integration and down-reflecting mirrors for monolithic integration can be fabricated using this technique. The proposed fabrication method is based on a combination of low temperature hollow cathode PECVD for silica-based waveguide deposition and a novel technique for forming a reflecting facet by wet chemical etching of PECVD silica

Keywords

cathodes; etching; integrated optics; integrated optoelectronics; mirrors; optical fabrication; optical waveguides; plasma CVD; silicon compounds; vapour phase epitaxial growth; PECVD silica; SiO₂; buried-channel silica waveguides; down-reflecting mirrors; fabrication method; hybrid integration; light-turning mirror fabrication; low temperature hollow cathode PECVD; monolithic integration; reflecting facet; silica-based channel waveguide core mirror; silica-based waveguide deposition; up reflecting mirrors; wet chemical etching; Cathodes; Chemicals; Mirrors; Monolithic integrated circuits; Optical device fabrication; Optical waveguides; Semiconductor waveguides; Silicon compounds; Substrates; Wet etching;

fLanguage

English

Journal_Title

Lightwave Technology, Journal of

Publisher

ieee

ISSN

0733-8724

Type

jour

DOI

10.1109/50.552123

Filename

552123