DocumentCode :
1256137
Title :
Failure Mechanism in Thick Film Materials for 300 ~{}^{\\circ}{\\rm C} Operation
Author :
Zhang, Rui ; Johnson, R. Wayne ; Vert, Alexey ; Zhang, Tan ; Shaddock, Dave
Author_Institution :
Electr. & Comput. Eng. Dept., Auburn Univ., Auburn, AL, USA
Volume :
2
Issue :
11
fYear :
2012
Firstpage :
1750
Lastpage :
1758
Abstract :
Geothermal well logging and instrumentation applications require electronics capable of operation at 300°C. SiC device technology enables the design and fabrication of analog circuits that can operate at these temperatures. However, to build functional systems that can operate at high temperatures, an interconnection and packaging technology must be developed to provide interconnectivity between different SiC devices and passive components. Thick film technology based on metals, glasses, and ceramics has the potential for high operating temperatures. The effect of biased 300°C storage on leakage current and the adhesion of different thick film conductors and multilayer dielectrics has been studied. Mobility of glass modifiers at 300°C has been shown to result in leakage current and adhesion loss.
Keywords :
adhesion; analogue integrated circuits; dielectric materials; failure analysis; integrated circuit interconnections; integrated circuit packaging; leakage currents; silicon compounds; thick film circuits; wide band gap semiconductors; SiC; SiC device technology; adhesion loss; analog circuits; failure mechanism; geothermal well logging; glass modifiers; instrumentation applications; interconnection technology; leakage current; multilayer dielectrics; packaging technology; passive components; temperature 300 degC; thick film conductors; thick film materials; thick film technology; Adhesives; Aging; Conductors; Dielectrics; Leakage current; Temperature measurement; Vehicles; Adhesion; high temperature; leakage current; thick film;
fLanguage :
English
Journal_Title :
Components, Packaging and Manufacturing Technology, IEEE Transactions on
Publisher :
ieee
ISSN :
2156-3950
Type :
jour
DOI :
10.1109/TCPMT.2012.2204995
Filename :
6255866
Link To Document :
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