Title :
Amorphous silicon phototransistor as nonlinear optical device for high dynamic range imagers
Author :
Nascetti, Augusto ; Caputo, Domenico
Author_Institution :
Dept. of Electron. Eng., Rome Univ., Italy
fDate :
3/1/2002 12:00:00 AM
Abstract :
An amorphous silicon bulk barrier phototransistor is studied as a basic element for the pixel of high dynamic photosensor arrays. The device is an n-i-δp-i-n structure whose optical gain shows a nonlinear dependence on the illumination intensity. For each applied bias voltage, a quasi-hyperbolic decrease of the optical gain as a function of the incident power is found. This behavior can be explained taking into account both the material characteristics (defect distribution, dopant concentration), and the structure properties. Our measurements lead to a minimum detectable signal of about 0.7 nW/cm2 independently on the applied voltage, making the device suitable for low illumination conditions. On the other hand, by increasing the input power up to 35 mW/cm2, we did not find saturation of output photocurrent leading to a dynamic range of at least of 120 dB. This value can be further increased by using as basic cell of the pixel the phototransistor and a resistor connected between the voltage supply and the collector electrode
Keywords :
amorphous semiconductors; elemental semiconductors; hydrogen; image sensors; nonlinear optics; phototransistors; silicon; Si:H; amorphous silicon phototransistor; bulk barrier phototransistor; current-voltage characterization; defect distribution; dopant concentration; high dynamic photosensor arrays; high dynamic range imagers; illumination intensity dependence; minimum detectable signal; n-i-δp-i-n stacked structure; nonlinear optical device; operating bias condition; Amorphous silicon; Lighting; Nonlinear optical devices; Nonlinear optics; Optical devices; Optical materials; Optical saturation; Phototransistors; Signal detection; Voltage;
Journal_Title :
Electron Devices, IEEE Transactions on