DocumentCode :
1256333
Title :
Polarization Matching in AlGaN-Based Multiple-Quantum-Well Deep Ultraviolet Laser Diodes on AlN Substrates Using Quaternary AlInGaN Barriers
Author :
Satter, Md Mahbub ; Lochner, Zachary ; Ryou, Jae-Hyun ; Shen, Shyh-Chiang ; Dupuis, Russell D. ; Yoder, Paul Douglas
Author_Institution :
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
Volume :
30
Issue :
18
fYear :
2012
Firstpage :
3017
Lastpage :
3025
Abstract :
A prototypical design of AlGaN deep ultraviolet (DUV) laser diodes (LDs) on AlN substrates employing tapered electron blocking layer is presented. Two-dimensional optoelectronic simulation predicts lasing at a target wavelength of 250 nm. Degradation of optical gain associated with spatial separation of electron and hole wave functions inside the active region may be considerably reduced in designs featuring quaternary AlInGaN barriers, by virtue of polarization charge matching. A systematic method for selection of polarization-free quaternary barrier compositions is proposed for 250 nm DUV LD designs, accompanied by a sensitivity analysis. The selection procedure presented here is readily applied to LDs and light-emitting diodes operating at other wavelengths.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; indium compounds; light emitting diodes; light polarisation; quantum well lasers; sensitivity analysis; ultraviolet sources; wave functions; wide band gap semiconductors; AlGaN-AlInGaN; AlN; AlN substrates; DUV LD; active region; electron wave functions; hole wave functions; lasing wavelength; light-emitting diodes; multiple-quantum-well deep ultraviolet laser diodes; optical gain degradation; polarization charge matching; polarization-free quaternary barrier compositions; prototypical design; selection procedure; sensitivity analysis; spatial separation; tapered electron blocking layer; two-dimensional optoelectronic simulation; wavelength 250 nm; Aluminum gallium nitride; Charge carrier processes; Epitaxial growth; Lasers; Optical polarization; Optical reflection; AlGaN active layer; AlN substrate; deep ultraviolet (DUV) laser diodes (LDs); polarization charge; quantum-confined Stark effect (QCSE); quaternary barrier; tapered electron blocking layer (EBL);
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/JLT.2012.2210998
Filename :
6256674
Link To Document :
بازگشت