DocumentCode
1256666
Title
Mechanism Analysis of the Flashover Quenching the Photoconductive Semiconductor Switch in
Author
Shi, Wei ; Jiang, Zenggong
Volume
40
Issue
9
fYear
2012
Firstpage
2221
Lastpage
2224
Abstract
The authors designed the voltage withstand test of the photoconductive semiconductor switch (PCSS) in which the electrode gap was 18 mm in the condition of the pulsed laser triggered. During the experiments, the flashover quenching the photon-activated charge domain (PACD) has been observed, namely, when the flashover occurred, the pulse current amplitude of semi-insulating GaAs PCSS was lower than the normal value without flashover and the rise time of the output current increased. The experiment indicates that the current output characteristics of PCSS contain the information of the flashover, when the flashover occurs with the discharge of the PCSS. The analysis denotes that the secondary electron emission in the flashover quenches the PACD and ultimately quenches the PCSS. The external electric field of the PACD modulated by the secondary electron emission determines if the PACD is to be quenched or not. The Gunn domain is imported to describe the critical state where the flashover quenches the PACD and the threshold condition has been given.
Keywords
Gunn effect; III-V semiconductors; electrodes; flashover; gallium arsenide; photoconductivity; quenching (thermal); semiconductor switches; sulphur compounds; GaAs; Gunn domain; PCSS discharge; SF6; critical state; current output characteristics; distance 18 mm; electrode gap; flashover quenching; photoconductive semiconductor switch; photon-activated charge domain; pulse current amplitude; pulsed laser; secondary electron emission; semi-insulating PCSS; voltage withstand test; Electrodes; Electron emission; Gallium arsenide; Laser theory; Surface emitting lasers; Switches; Flashover; photoconductive semiconductor switch (PCSS); photon-activated charge domain (PACD); secondary electron emission; semi-insulating GaAs;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2012.2207408
Filename
6256751
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