DocumentCode :
1257809
Title :
Low-Noise Microwave Performance of 0.1 \\mu m Gate AlInN/GaN HEMTs on SiC
Author :
Sun, Haifeng ; Alt, Andreas R. ; Benedickter, Hansruedi ; Feltin, Eric ; Carlin, Jean-François ; Gonschorek, Marcus ; Grandjean, Nicolas ; Bolognesi, C.R.
Author_Institution :
Millimeter-Wave Electron. Group, ETH-Zurich, Zürich, Switzerland
Volume :
20
Issue :
8
fYear :
2010
Firstpage :
453
Lastpage :
455
Abstract :
We report the first microwave noise characterization of AlInN/GaN HEMTs. Transistors with a 0.1 μ m gate implemented on a semi-insulating SiC substrate achieve a maximum current density of 1.92 A/mm at VGS = 0 V, a measured transconductance gM = 480 mS/mm, and a peak current gain cutoff frequency fT = 121 GHz with a simultaneous maximum oscillation frequency fMAX = 142 GHz. At 10 (20) GHz, our HEMTs exhibit a minimum noise figure Fmin of 0.62 (1.5) dB together with a high associated gain GA of 15.4 (13.3) dB. The Fmin values are among the lowest reported in nitride HEMTs, and the GA values are the best so far found in the literature, demonstrating the excellent potential of AlInN/GaN HEMTs for low-noise microwave applications.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; indium compounds; microwave field effect transistors; semiconductor device noise; silicon compounds; wide band gap semiconductors; AlInN-GaN; AlInN-GaN HEMT; SiC; frequency 121 GHz; low-noise microwave performance; microwave noise characterization; oscillation frequency; peak current gain cutoff frequency; semiinsulating substrate; size 0.1 micron; transconductance; AlInN/GaN; high-electron mobility transistors (HEMTs); microwave noise;
fLanguage :
English
Journal_Title :
Microwave and Wireless Components Letters, IEEE
Publisher :
ieee
ISSN :
1531-1309
Type :
jour
DOI :
10.1109/LMWC.2010.2049008
Filename :
5524058
Link To Document :
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