DocumentCode :
1257932
Title :
Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge
Author :
Bogaerts, Annemie ; Gijbels, Renaat
Author_Institution :
Dept. of Chem., Antwerp Univ., Belgium
Volume :
27
Issue :
5
fYear :
1999
fDate :
10/1/1999 12:00:00 AM
Firstpage :
1406
Lastpage :
1415
Abstract :
A three-dimensional Monte Carlo model has been developed for the argon ions and fast argon atoms in the RF sheath of a capacitively coupled RF glow discharge in argon. Our interest in the argon ions and fast argon atoms in the RF sheath arises from the fact that the glow discharge under study is used as sputtering source for analytical chemistry. This source operates at typical working conditions of a few torr pressure and about 10 W incoming power. The argon ion and atom Monte Carlo model has been coupled to a hybrid Monte Carlo-fluid model for electrons and argon ions developed before to obtain fully self-consistent results. Typical results of this model include, among others, the densities, fluxes, collision rates, mean energies, and energy distributions of the argon ions and atoms. Moreover, we have investigated how many RF cycles have to be followed before periodic steady state is reached, and the effects of all previous RF cycles are correctly accounted for. This is found to be the case for about 20-25 RF cycles
Keywords :
Monte Carlo methods; argon; glow discharges; high-frequency discharges; plasma sheaths; plasma simulation; sputtering; 10 W; Ar; Ar ions; Monte Carlo model; RF cycles; RF sheath; analytical chemistry; capacitively coupled RF glow discharge; collision rates; densities; energy distributions; fast argon atoms; fluxes; fully self-consistent results; high-frequency discharge; hybrid Monte Carlo-fluid model; mean energies; periodic steady state; radio-frequency discharge; sputtering source; three-dimensional Monte Carlo model; working conditions; Argon; Atomic measurements; Electrons; Glow discharges; Monte Carlo methods; Optical materials; Plasma applications; Plasma chemistry; Plasma displays; Radio frequency;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/27.799819
Filename :
799819
Link To Document :
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