Title :
Sheath propagation along the cathode of a plasma opening switch
Author :
Fruchtman, Amnon ; Grossmann, John M. ; Swanekamp, Stephen B. ; Ottinger, Paul F.
Author_Institution :
Sci. Applications Int. Corp., McLean, VA, USA
fDate :
10/1/1999 12:00:00 AM
Abstract :
A model is proposed for sheath propagation along the cathode of a plasma opening switch that is valid for switch conditions intermediate to the erosion-dominated and MHD-dominated regimes. The model assumes that the sheath propagates due to erosion of the plasma that conducts the current. The calculated velocity of propagation agrees with particle-in-cell simulation results much better than do velocities calculated by previous models that assumed magnetic pressure opens a vacuum gap along the cathode
Keywords :
cathodes; plasma magnetohydrodynamics; plasma sheaths; plasma simulation; plasma switches; plasma transport processes; plasma-wall interactions; pulsed power switches; wear; MHD-dominated regimes; cathode; erosion; erosion-dominated regimes; magnetic pressure; particle-in-cell simulation; plasma opening switch; propagation velocity; sheath propagation; switch conditions; vacuum gap; Cathodes; Electron emission; Insulation; Magnetic analysis; Magnetic fields; Physics; Plasma density; Plasma sheaths; Plasma simulation; Switches;
Journal_Title :
Plasma Science, IEEE Transactions on
