• DocumentCode
    1258048
  • Title

    Observation of strong self-focusing of an intense relativistic electron beam impinging on a SiO2 target

  • Author

    Vermare, C. ; Donohue, John T. ; Labrouche, J. ; Le Taillandier de Gabory, P. ; Villate, D.

  • Author_Institution
    CEA/Centre d´´Etudes Sci. et Tech. d´´Aquitaine, Le Barp, France
  • Volume
    27
  • Issue
    5
  • fYear
    1999
  • fDate
    10/1/1999 12:00:00 AM
  • Firstpage
    1501
  • Lastpage
    1509
  • Abstract
    A substantial reduction in the spot size of an electron beam striking a SiO2 target has been observed during a 60 ns pulse. We attribute this to the emission of positive ions, most probably protons, from the target. These are then accelerated upstream and focused along the axis by the electron beam, where they partially neutralize the space-charge of the beam, and produce a sharp pinch. A simulation of the effect with a particle-in-cell code provides an adequate quantitative description, and a simple model, based on space-charge-limited emission of protons by the target confirms qualitatively the results of the simulation. The presence of an aluminum foil on the upstream side of the target is shown to suppress the effect, probably by stopping the protons
  • Keywords
    digital simulation; electron beam focusing; electron-surface impact; relativistic electron beams; secondary ion emission; self-focusing; silicon compounds; space charge; 60 ns; LELIA injector; SiO2; SiO2 target; aluminum foil; beam space-charge; electron beam; induction machine; intense relativistic electron beam; ion acceleration; ion focusing; partial neutralization; particle beam measurement; particle-in-cell code; positive ions; proton stopping; protons; secondary ion emission; sharp pinch; simulation; space-charge-limited emission; spot size; strong self-focusing; suppression; upstream acceleration; Acceleration; Aluminum; Electron beams; Heating; Induction machines; Ion emission; Particle beam optics; Particle beams; Protons; Silicon compounds;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.799832
  • Filename
    799832