DocumentCode :
1258201
Title :
Development of Self-Organized Filaments in a Microgap Atmospheric Barrier Discharge on Bismuth Silicon Oxide Dielectrics
Author :
Fue, Hiroyuki ; Hasegawa, Tatsuya ; Sato, Tomohiko ; Mukaigawa, Seiji ; Takaki, Koichi ; Fujiwara, Tamiya
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Iwate Univ., Morioka, Japan
Volume :
39
Issue :
11
fYear :
2011
Firstpage :
2140
Lastpage :
2141
Abstract :
In this paper, we present subsequent images of self-organized filaments in a microgap atmospheric barrier discharge with and without bismuth silicon oxide (BSO) dielectrics. The images were obtained using an intensified charge-coupled device digital camera. Different developments of the discharge were observed in the region occupied by the filaments in the case of BSO and glass dielectrics. The charge distribution on the dielectric surface played an important role in the development of the self-organized patterns.
Keywords :
bismuth alloys; discharges (electric); plasma diagnostics; plasma transport processes; BSO; bismuth silicon oxide dielectrics; charge distribution; glass dielectrics; intensified charge-coupled device digital camera; microgap atmospheric barrier discharge; self-organized filament image; self-organized pattern development; Crystals; Dielectrics; Discharges; Glass; Indium tin oxide; Surface discharges; Surface treatment; Bismuth silicon oxide (BSO); dielectric barrier discharge; helium; microgap discharge; self-organized discharge;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2011.2157979
Filename :
5930371
Link To Document :
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