Title :
Effects of process parameters on structure and magnetic properties of sputtered Ni-Zn ferrite thin films
Author :
Lee, Jang-Sik ; Lee, Byung-II ; Joo, Seung-Ki
Author_Institution :
Sch. of Mater. Sci. & Eng., Seoul Nat. Univ., South Korea
fDate :
9/1/1999 12:00:00 AM
Abstract :
Ni-Zn ferrite thin films were prepared by RF magnetron sputtering at room temperature. The structure and magnetic properties of the as-deposited films were investigated as a function of oxygen partial pressure, working pressure and RF power. Deposition conditions greatly affect the crystallinity and magnetic properties of the Ni-Zn ferrite thin films. Ni-Zn ferrite thin films with spinel structure could be obtained by adjusting the process parameters without substrate heating or post heat treatment. The Ni-Zn ferrite thin film deposited with the optimized condition at room temperature showed saturation magnetization of 170 emu/cm3 and coercivity of 35 Oe
Keywords :
coercive force; ferrites; magnetic thin films; magnetisation; nickel compounds; sputtered coatings; zinc compounds; 300 K; Ni-Zn ferrite; NiZnFeO; O2 partial pressure dependence; RF magnetron sputtering; RF power dependence; as-deposited films; coercivity; crystallinity; deposition conditions; magnetic properties; process parameters effects; saturation magnetization; spinel structure; sputtered thin films; working pressure dependence; Crystallization; Ferrite films; Heat treatment; Magnetic films; Magnetic properties; Radio frequency; Saturation magnetization; Sputtering; Substrates; Temperature;
Journal_Title :
Magnetics, IEEE Transactions on
