Oblique-incidence anisotropy in very thin Ni-Fe films

Author

Michijima, M. ; Hayashi, H. ; Kyoho, M. ; Nakabayashi, T. ; Komoda, T. ; Kira, T.

Author_Institution

Precision Technol. Dev. Center, Sharp Corp., Tenri, Japan

Volume

35

Issue

5

fYear

1999

fDate

9/1/1999 12:00:00 AM

Firstpage

3442

Lastpage

3444

Abstract

A study was made on the magnetic anisotropy in very thin Ni-Fe films of 10 nm or less sputtered at oblique-incidence. The anisotropy field H_k´s of Ni-Fe films induced on Ta films by oblique-incidence was different from that on Al₂O₃ films and was reduced with an application of the RF substrate bias while the films were being formed. Hk´s, at oblique-incidence, were dependent on the film structure. The difference in the chain structure of Ni-Fe films is considered to be the cause of difference in H_k

Keywords

crystal structure; ferromagnetic materials; iron alloys; magnetic anisotropy; magnetic thin films; nickel alloys; sputtered coatings; 10 nm; Al₂O₃; Al₂O₃ films; Ni-Fe; RF substrate bias; Ta; Ta films; anisotropy field; chain structure; film structure; magnetic anisotropy; oblique-incidence; oblique-incidence anisotropy; very thin Ni-Fe films; Anisotropic magnetoresistance; Crystallization; Magnetic anisotropy; Magnetic films; Magnetic properties; Radio frequency; Sputtering; Substrates; X-ray diffraction; X-ray scattering;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.800551

Filename

800551