Title :
Oblique-incidence anisotropy in very thin Ni-Fe films
Author :
Michijima, M. ; Hayashi, H. ; Kyoho, M. ; Nakabayashi, T. ; Komoda, T. ; Kira, T.
Author_Institution :
Precision Technol. Dev. Center, Sharp Corp., Tenri, Japan
fDate :
9/1/1999 12:00:00 AM
Abstract :
A study was made on the magnetic anisotropy in very thin Ni-Fe films of 10 nm or less sputtered at oblique-incidence. The anisotropy field Hk´s of Ni-Fe films induced on Ta films by oblique-incidence was different from that on Al2O3 films and was reduced with an application of the RF substrate bias while the films were being formed. Hk´s, at oblique-incidence, were dependent on the film structure. The difference in the chain structure of Ni-Fe films is considered to be the cause of difference in Hk
Keywords :
crystal structure; ferromagnetic materials; iron alloys; magnetic anisotropy; magnetic thin films; nickel alloys; sputtered coatings; 10 nm; Al2O3; Al2O3 films; Ni-Fe; RF substrate bias; Ta; Ta films; anisotropy field; chain structure; film structure; magnetic anisotropy; oblique-incidence; oblique-incidence anisotropy; very thin Ni-Fe films; Anisotropic magnetoresistance; Crystallization; Magnetic anisotropy; Magnetic films; Magnetic properties; Radio frequency; Sputtering; Substrates; X-ray diffraction; X-ray scattering;
Journal_Title :
Magnetics, IEEE Transactions on
