DocumentCode :
1260288
Title :
Junctionless Multiple-Gate Transistors for Analog Applications
Author :
Doria, Rodrigo Trevisoli ; Pavanello, Marcelo Antonio ; Trevisoli, Renan Doria ; De Souza, Michelly ; Lee, Chi-Woo ; Ferain, Isabelle ; Akhavan, Nima Dehdashti ; Yan, Ran ; Razavi, Pedram ; Yu, Ran ; Kranti, Abhinav ; Colinge, Jean-Pierre
Author_Institution :
Dept. of Electr. Eng., Centro Univ. da FEI, Sao Bernardo do Campo, Brazil
Volume :
58
Issue :
8
fYear :
2011
Firstpage :
2511
Lastpage :
2519
Abstract :
This paper presents the evaluation of the analog properties of nMOS junctionless (JL) multigate transistors, comparing their performance with those exhibited by inversion-mode (IM) trigate devices of similar dimensions. The study has been performed for devices operating in saturation as single-transistor amplifiers, and we have considered the dependence of the analog properties on fin width Wfin and temperature T. Furthermore, this paper aims at providing a physical insight into the analog parameters of JL transistors. For that, in addition to device characterization, 3-D device simulations were performed. It is shown that, depending on gate voltage, JL devices can present both larger Early voltage VEA and larger intrinsic voltage gain AV than IM devices of similar dimensions. In addition, VEA and AV are always improved in JL devices when the temperature is increased, whereas they present a maximum value around room temperature for IM transistors.
Keywords :
MOSFET; amplifiers; nanowires; silicon-on-insulator; 3D device simulation; IM transistor; JL transistor; analog property; gate voltage; intrinsic voltage gain; inversion mode trigate device; nMOS junctionless multigate transistor; single transistor amplifier; Doping; Logic gates; MOS devices; Performance evaluation; Semiconductor process modeling; Temperature; Transistors; Analog operation; junctionless (JL) transistor; multiple gate transistor; silicon on insulator;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2011.2157826
Filename :
5934399
Link To Document :
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