An accurate measurement of magnetostriction of thin films by using nano-indentation system

Author

Shima, Toshiyuki ; Fujimori, Hiroyasu

Author_Institution

Inst. for Mater. Res., Tohoku Univ., Sendai, Japan

Volume

35

Issue

5

fYear

1999

fDate

9/1/1999 12:00:00 AM

Firstpage

3832

Lastpage

3834

Abstract

We have constructed a simple and sensitive tool for the measurement of magnetostriction of thin films. This tool is based on a commercial nano-indentation system, which enable the measurement of the elastic properties of small samples, such as thin films and precipitates, as well as the magnetostrictively induced deflection of cantilevered substrates on which thin film are deposited. The reliability of the present tool is tested by measuring Permalloy thin films. The resolution of the displacement is estimated to be less than 1 nm. Combined with an accurate determination of Young´s modulus, the present system appears suitable to measure magnetostriction down to 10 ^-7, if a 1 μm thick film coated on a 0.3 mm thick film is used

Keywords

Permalloy; Young´s modulus; ferromagnetic materials; indentation; magnetic thin films; magnetic variables measurement; magnetostriction; 0.3 mm; 1 mum; NiFe; Permalloy thin films; Youngs modulus; accurate measurement; elastic properties; magnetostriction; magnetostrictively induced deflection; nanoindentation system; thin films; Displacement measurement; Force measurement; Magnetic field measurement; Magnetic films; Magnetic properties; Magnetostriction; Sputtering; Substrates; Thickness measurement; Transistors;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.800680

Filename

800680