• DocumentCode
    1260334
  • Title

    Impact of ZnO Polarization on the Characteristics of Metal–Ferroelectric–ZnO Field Effect Transistor

  • Author

    Tan, Qiuhong ; Wang, Jinbin ; Zhong, Xiangli ; Zhou, Yichun ; Wang, Qianjin ; Zhang, Yi ; Zhang, X. ; Huang, S.

  • Author_Institution
    Xiangtan Univ., Xiangtan, China
  • Volume
    58
  • Issue
    8
  • fYear
    2011
  • Firstpage
    2738
  • Lastpage
    2742
  • Abstract
    A model has been developed to address polarization interaction between the ZnO and the ferroelectrics in metal-ferroelectric-ZnO field-effect transistors (MFZFETs). The C-V, I-V, and retention characteristics of MFZFETs and conventional metal-ferroelectric-Si field-effect transistors (MFSFETs) are comparatively studied by using the semiconductor transport theory with inclusion of the polarization model. Results revealed that MFZFETs demonstrate wider memory window, larger on-state drain current, and better retention characteristics, compared with MFSFETs because of the involvement of the polarization effect in ZnO.
  • Keywords
    II-VI semiconductors; ferroelectric devices; field effect transistors; transport processes; wide band gap semiconductors; zinc compounds; C-V characteristic; I-V characteristic; MFZFET; ZnO; memory window; metal-ferroelectric-Si field-effect transistor; metal-ferroelectric-ZnO field effect transistor; on-state drain current; polarization impact; retention characteristic; semiconductor transport theory; Capacitance; Logic gates; Materials; Physics; Semiconductor device modeling; Transistors; Zinc oxide; Ferroelectric field-effect-transistor (FeFET); ZnO polarization; metal–ferroelectric–ZnO field-effect transistor (MFZFET); nonvolatile memory; oxide semiconductor;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2011.2157348
  • Filename
    5934404