Title :
Impact of ZnO Polarization on the Characteristics of Metal–Ferroelectric–ZnO Field Effect Transistor
Author :
Tan, Qiuhong ; Wang, Jinbin ; Zhong, Xiangli ; Zhou, Yichun ; Wang, Qianjin ; Zhang, Yi ; Zhang, X. ; Huang, S.
Author_Institution :
Xiangtan Univ., Xiangtan, China
Abstract :
A model has been developed to address polarization interaction between the ZnO and the ferroelectrics in metal-ferroelectric-ZnO field-effect transistors (MFZFETs). The C-V, I-V, and retention characteristics of MFZFETs and conventional metal-ferroelectric-Si field-effect transistors (MFSFETs) are comparatively studied by using the semiconductor transport theory with inclusion of the polarization model. Results revealed that MFZFETs demonstrate wider memory window, larger on-state drain current, and better retention characteristics, compared with MFSFETs because of the involvement of the polarization effect in ZnO.
Keywords :
II-VI semiconductors; ferroelectric devices; field effect transistors; transport processes; wide band gap semiconductors; zinc compounds; C-V characteristic; I-V characteristic; MFZFET; ZnO; memory window; metal-ferroelectric-Si field-effect transistor; metal-ferroelectric-ZnO field effect transistor; on-state drain current; polarization impact; retention characteristic; semiconductor transport theory; Capacitance; Logic gates; Materials; Physics; Semiconductor device modeling; Transistors; Zinc oxide; Ferroelectric field-effect-transistor (FeFET); ZnO polarization; metal–ferroelectric–ZnO field-effect transistor (MFZFET); nonvolatile memory; oxide semiconductor;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2011.2157348