• DocumentCode
    1260663
  • Title

    Tuning Source/Drain Extension Profile for Current Matching in Nanowire CMOS Logic

  • Author

    Kaushal, Gaurav ; Manhas, S.K. ; Maheshwaram, Satish ; Dasgupta, S. ; Anand, Bulusu ; Singh, Navab

  • Author_Institution
    Dept. of Electron. & Comput. Eng., Indian Inst. of Technol. Roorkee, Roorkee, India
  • Volume
    11
  • Issue
    5
  • fYear
    2012
  • Firstpage
    1033
  • Lastpage
    1039
  • Abstract
    We present a novel approach for matching the drive current of n-FET with p-FET in CMOS logic circuits through source-drain extension profile tuning. Our approach overcomes the current quantization issue in nanowire/FinFET devices. We show that, in comparison to conventionally used method, where the width of p- device is increased to match the drive of n-device, the proposed approach provides significant reduction in circuit area and power consumption. When compared to the high-performance CMOS inverter (current matched using device width), the proposed method shows 28% lower area and 38% saving in power in case of Si-nanowire CMOS inverter. Further, the technique is applicable to planar CMOS showing excellent gain.
  • Keywords
    CMOS logic circuits; MOSFET; invertors; nanoelectronics; nanowires; silicon; Si; current matching; high-performance CMOS inverter; n-FET drive current; nanowire CMOS inverter; nanowire CMOS logic circuits; nanowire-FinFET devices; p-FET drive current; tuning source-drain extension profile tuning; CMOS integrated circuits; Capacitance; FinFETs; High definition video; Inverters; Logic gates; CMOS inverter; Si-nanowire FET (NW FET); gate-all-around;
  • fLanguage
    English
  • Journal_Title
    Nanotechnology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1536-125X
  • Type

    jour

  • DOI
    10.1109/TNANO.2012.2211889
  • Filename
    6262483