DocumentCode :
1260663
Title :
Tuning Source/Drain Extension Profile for Current Matching in Nanowire CMOS Logic
Author :
Kaushal, Gaurav ; Manhas, S.K. ; Maheshwaram, Satish ; Dasgupta, S. ; Anand, Bulusu ; Singh, Navab
Author_Institution :
Dept. of Electron. & Comput. Eng., Indian Inst. of Technol. Roorkee, Roorkee, India
Volume :
11
Issue :
5
fYear :
2012
Firstpage :
1033
Lastpage :
1039
Abstract :
We present a novel approach for matching the drive current of n-FET with p-FET in CMOS logic circuits through source-drain extension profile tuning. Our approach overcomes the current quantization issue in nanowire/FinFET devices. We show that, in comparison to conventionally used method, where the width of p- device is increased to match the drive of n-device, the proposed approach provides significant reduction in circuit area and power consumption. When compared to the high-performance CMOS inverter (current matched using device width), the proposed method shows 28% lower area and 38% saving in power in case of Si-nanowire CMOS inverter. Further, the technique is applicable to planar CMOS showing excellent gain.
Keywords :
CMOS logic circuits; MOSFET; invertors; nanoelectronics; nanowires; silicon; Si; current matching; high-performance CMOS inverter; n-FET drive current; nanowire CMOS inverter; nanowire CMOS logic circuits; nanowire-FinFET devices; p-FET drive current; tuning source-drain extension profile tuning; CMOS integrated circuits; Capacitance; FinFETs; High definition video; Inverters; Logic gates; CMOS inverter; Si-nanowire FET (NW FET); gate-all-around;
fLanguage :
English
Journal_Title :
Nanotechnology, IEEE Transactions on
Publisher :
ieee
ISSN :
1536-125X
Type :
jour
DOI :
10.1109/TNANO.2012.2211889
Filename :
6262483
Link To Document :
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