Title :
Increasing the resistivity of electrodeposited high BS CoNiFe thin film
Author :
Yokoshima, Tokihiko ; Kaseda, Manabu ; Yamada, Masahiro ; Nakanishi, Takuya ; Momma, Toshiyuki ; Osaka, Tetsuya
Author_Institution :
Dept. of Appl. Chem., Waseda Univ., Tokyo, Japan
fDate :
9/1/1999 12:00:00 AM
Abstract :
In order to increase the resistivity of electrodeposited high B S CoNiFe thin film, the effect of an organic additive such as diethylenetriamine (DET) added to the plating bath was investigated. The values of ρ and HC were gradually increased as a function of DET concentration. The desirable soft magnetic CoNiFe thin film with ρ=25-90 μΩ-cm under the conditions of BS>1.9 T and HC<2.5 Oe was developed as function of carbon in the deposited films. Additionally, the high resistivity CoNiFe thin film with ρ=130 μΩ-cm was established under the conditions of B S=1.7 T and HC<6 0e
Keywords :
cobalt alloys; electrical resistivity; electrodeposition; ferromagnetic materials; iron alloys; magnetic flux; magnetic thin films; metallic thin films; nickel alloys; soft magnetic materials; 1.7 T; 1.9 T; 130 muohmcm; 25 to 90 muohmcm; CoNiFe; DET concentration; diethylenetriamine; electrodeposited high BS CoNiFe thin film; high resistivity CoNiFe thin film; organic additive; plating bath; resistivity; soft magnetic CoNiFe thin film; Additives; Conductivity; Magnetic films; Magnetic flux; Magnetic materials; Magnetic recording; Plasma measurements; Saturation magnetization; Soft magnetic materials; Transistors;
Journal_Title :
Magnetics, IEEE Transactions on
