DocumentCode :
1261784
Title :
Highly defined narrow track write heads fabricated by focused ion beam trimming with the Al2O3 refilling process
Author :
Ishi, Tsutomu ; Nonaka, Yoshhiro ; Matsubara, Takamitsu ; Ishiwata, Nobuyuki
Author_Institution :
Memory Res. Labs., NEC Corp., Tokyo, Japan
Volume :
35
Issue :
5
fYear :
1999
fDate :
9/1/1999 12:00:00 AM
Firstpage :
2541
Lastpage :
2543
Abstract :
We have developed a focused ion beam trimmed write head using Al 2O3 refilling, in which an Al2O3 film was deposited and a two-step lapping process was performed after FIB trimming at the air bearing surface. This process provided highly defined pole edges without any rounded corners, well-filled hollows, and a damage-free read element. Good environment-proof characteristics were also obtained, because a diamond-like carbon film was deposited as a protective layer on the element after FIB trimming. The fabricated head showed good overwrite characteristics in half-micron width writing
Keywords :
focused ion beam technology; magnetic heads; sputter etching; Al2O3; FIB trimming; air bearing surface; alumina refilling process; damage-free read element; diamond-like carbon film; environment-proof characteristics; half-micron width writing; highly defined narrow track write heads; highly defined pole edges; overwrite characteristics; pole tip angle; pole trimming; protective layer; spin valve read element; two-step lapping process; well-filled hollows; Chemical elements; Diamond-like carbon; Ion beams; Lapping; Magnetic heads; National electric code; Protection; Scanning electron microscopy; Sputtering; Writing;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.800884
Filename :
800884
Link To Document :
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