Title :
Recording heads with track widths suitable for 100 Gbit/in2 density
Author :
Khizroev, S.K. ; Kryder, M.H. ; Ikeda, Y. ; Rubin, K. ; Arnett, P. ; Best, M. ; Thompson, D.A.
Author_Institution :
Data Storage Syst. Center, Carnegie Mellon Univ., Pittsburgh, PA, USA
fDate :
9/1/1999 12:00:00 AM
Abstract :
Focused ion beam etching has been used to trim both longitudinal and perpendicular recording heads with track widths as narrow as 60 nm. 3D boundary element modeling has been used to optimize trimming parameters. Tracks written with the trimmed heads using spin-stands and imaged using magnetic force microscopy were as narrow as 100 nm
Keywords :
boundary-elements methods; focused ion beam technology; magnetic force microscopy; magnetic heads; perpendicular magnetic recording; sputter etching; 100 nm; 3D boundary element modeling; 60 nm; focused ion beam etching; longitudinal recording heads; magnetic force microscopy; narrow track widths; optimized trimming parameters; perpendicular recording heads; soft underlayer; spin-stands; Etching; Focusing; Ion beams; Magnetic flux; Magnetic force microscopy; Magnetic heads; Magnetic materials; Magnetic recording; Perpendicular magnetic recording; Saturation magnetization;
Journal_Title :
Magnetics, IEEE Transactions on
