• DocumentCode
    1262035
  • Title

    Cr underlayer lattice modulation through alloying and multi-layer construction

  • Author

    Wong, Bunsen Y. ; Ying, Ji Feng

  • Author_Institution
    MMC Technol., San Jose, CA, USA
  • Volume
    35
  • Issue
    5
  • fYear
    1999
  • fDate
    9/1/1999 12:00:00 AM
  • Firstpage
    2646
  • Lastpage
    2648
  • Abstract
    The lattice parameter (a) of bcc CrX films can be predicted using the weighted average of the Cr and X atomic radius. However, a of the sputtered CrX film depends strongly on substrate biasing. a of the underlayer can also be modified using a CrX/Cr dual layer construction with different CrX alloys. By adjusting the thickness fraction of the CrX layer within the CrX/Cr underlayer structure, various a within the upper and lower fraction limits can be realized. Hence, a can be fine tuned to lattice match the Co-alloy and enhances the Mrt of the magnetic film
  • Keywords
    chromium alloys; lattice constants; magnetic multilayers; magnetic thin films; sputtered coatings; Cr alloy sputtered magnetic thin film; Cr underlayer; alloying; dual layer; lattice parameter modulation; multilayer; substrate bias; Alloying; Atomic measurements; Chromium alloys; Cobalt alloys; Lattices; Magnetic films; Magnetic properties; Modular construction; Optical films; Substrates;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.800928
  • Filename
    800928