DocumentCode :
1262851
Title :
Residual stress of chromium, magnetic, and carbon films
Author :
Peng, Grant ; Wu, Fang ; Lin, Judy
Author_Institution :
Komag Inc., San Jose, CA, USA
Volume :
35
Issue :
5
fYear :
1999
fDate :
9/1/1999 12:00:00 AM
Firstpage :
3004
Lastpage :
3006
Abstract :
Residual mechanical stresses are measured for ultra thin films, Cr, Co-alloy and carbon and their combinations by means of an optical interferometer. The individual stress is additive. The dependence of the carbon, Cr, and Co-alloy film stresses on film thickness indicates that the residual stress originates from film deposition processes as an interfacial phenomenon. The dependence of stress on the chemical properties of the carbon film is also studied in this paper
Keywords :
carbon; chromium; internal stresses; light interferometry; magnetic thin films; C; Co alloy film; Cr; carbon film; chromium film; magnetic film; optical interferometry; residual mechanical stress; ultrathin film; Amorphous magnetic materials; Chromium; Diamond-like carbon; Magnetic films; Mechanical variables measurement; Optical films; Optical interferometry; Residual stresses; Stress measurement; Substrates;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.801066
Filename :
801066
Link To Document :
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