• DocumentCode
    1262863
  • Title

    Nonequilibrium strain and Curie temperature in as-deposited Mn ferrite thin films by RF sputtering

  • Author

    Tanaka, Toshikam

  • Author_Institution
    Dept. of Inf. & Control Eng., Toba Nat. Coll. of Maritime Technol., Japan
  • Volume
    35
  • Issue
    5
  • fYear
    1999
  • fDate
    9/1/1999 12:00:00 AM
  • Firstpage
    3010
  • Lastpage
    3012
  • Abstract
    Nonequilibrium lattice distances and Curie temperatures have been observed in as-deposited Mn ferrite thin films by rf sputtering at RT and 300°C, although they show crystalline X-ray diffraction patterns. The (400) lattice distance is larger, while the (111), (222), and (444) lattice distances are smaller than the bulk values. This implies that a compressive stress along the [100] axis and a tensile stress along the [111] axis are present in as-deposited films. The Curie temperatures of as-deposited films are 60~160°C higher than the bulk value. The degree of the nonequilibrium is larger for the films deposited at a lower substrate temperature. The nonequilibrium in as-deposited films relaxes with heat treatment in an N2 atmosphere at 610°C
  • Keywords
    Curie temperature; X-ray diffraction; ferrites; heat treatment; internal stresses; magnetic thin films; manganese compounds; sputtered coatings; Curie temperature; Mn ferrite thin film; MnFe2O4; RF sputtering; X-ray diffraction; compressive stress; heat treatment; nonequilibrium strain; tensile stress; Capacitive sensors; Compressive stress; Crystallization; Ferrite films; Heat treatment; Lattices; Sputtering; Temperature; Tensile stress; X-ray diffraction;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.801068
  • Filename
    801068