Title :
Electro-ferrite plating of magnetite at 24-80°C
Author :
Nishimura, Kazuhiro ; Kitamoto, Yoshitaka ; Abe, Masanori
Author_Institution :
Dept. of Phys. Electron., Tokyo Inst. of Technol., Japan
fDate :
9/1/1999 12:00:00 AM
Abstract :
At room temperature (24°C) magnetite (Fe3O4 ) films are successfully grown from an aqueous solution utilizing anodic oxidation of Fe2+ to Fe3+. Applying DC anodic voltage of 0.4 V, single phase Fe3O4 films are grown at various temperatures from 24 to 80°C on NESA glass substrates from mixed solutions of FeCl2+NH3. Fixing the concentration of FeCl2, the concentrations at which we can obtain the highest film deposition rate are determined at 24°C and 80°C. The films have a saturation magnetization of magnitude equal to that of bulk sample
Keywords :
anodisation; electroplating; ferrites; magnetic thin films; magnetisation; 0.4 V; 24 to 80 C; DC anodic voltage; Fe3O4; Fe3O4 films; Fe2+; Fe3+; FeCl2; NESA glass substrates; NH3; anodic oxidation; aqueous solution; electro-ferrite plating; film deposition rate; magnetite; mixed solutions; room temperature; saturation magnetization; single phase Fe3O4 films; Electrodes; Ferrite films; Glass; Magnetic films; Plasma temperature; Saturation magnetization; Scanning electron microscopy; Substrates; Surface morphology; X-ray scattering;
Journal_Title :
Magnetics, IEEE Transactions on
