DocumentCode
1263442
Title
Metal-to-Multilayer-Graphene Contact—Part I: Contact Resistance Modeling
Author
Khatami, Yasin ; Li, Hong ; Xu, Chuan ; Banerjee, Kaustav
Author_Institution
Department of Electrical and Computer Engineering, University of California, Santa Barbara, CA, USA
Volume
59
Issue
9
fYear
2012
Firstpage
2444
Lastpage
2452
Abstract
Parasitic components are becoming increasingly important with geometric scaling in nanoscale electronic devices and interconnects. The parasitic contact resistance between metal electrodes and multilayer graphene (MLG) is a key factor determining the performance of MLG-based structures in various applications. The available methods for characterizing metal–MLG contact interfaces rely on a model based on the top-contact structure, but it ignores the edge contacts that can greatly reduce the contact resistance. Therefore, in the present work, a rigorous theoretical 1-D model for metal–MLG contact is developed for the first time. The contribution of the major components of resistance—the top and edge contacts (side and end contacts) and the MLG sheet resistivity—to the total resistance of the structure is included in the model. The 1-D model is compared to a 3-D model of the system, and a method for investigation and optimization of the range of validity of the 1-D model is developed. The results of this work provide valuable insight to both the characterization and design of metal–MLG contacts.
Keywords
Conductivity; Contact resistance; Resistance; Solid modeling; 1-D contact model; Contact resistance; edge contact; multilayer graphene (MLG); top contact;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2012.2205256
Filename
6266726
Link To Document