Title :
Correlated Flicker Noise and Hole Mobility Characteristics of
Uniaxially Strained SiGe FINFETs
Author :
Rajamohanan, Bijesh ; Ok, Injo ; Mujumdar, Salil ; Hobbs, Chris ; Majhi, Prashant ; Jammy, Raj ; Datta, Suman
Author_Institution :
Dept. of Electr. Eng., Pennsylvania State Univ., University Park, PA, USA
Abstract :
Hole mobility and flicker noise characteristics of uniaxially strained ( 110)/〈110〉 Si0.75 Ge0.25 pFINFETs (SSGOI0.25) are investigated in this letter. Equivalent gate referred flicker noise in SSGOI0.25 is dominated by correlated number and mobility fluctuation in the low-bias regime and Hooge mobility fluctuation in the high-bias regime. The extracted Hooge parameter in SSGOI0.25 and in Si pFINFETs is 10-5 and 10-4, respectively. The lower value of the Hooge parameter in SSGOI0.25 pFINFETs is attributed to improved phonon-limited mobility compared to the SOI pFINFETs. SSGOI0.25 FINFETs are found to exhibit the lowest equivalent gate referred flicker noise among any nonplanar devices reported to date.
Keywords :
Ge-Si alloys; MOSFET; flicker noise; hole mobility; 110)/〈110〉 uniaxially strained FINFET; Hooge mobility fluctuation; SOI pFINFET; SSGOI0.25; Si0.75Ge0.25; correlated flicker noise characteristics; correlated number; equivalent gate referred flicker noise; high-bias regime; hole mobility characteristics; improved phonon-limited mobility; low-bias regime; nonplanar devices; FinFETs; Logic gates; Noise; Scattering; Silicon; Silicon germanium; Temperature measurement; $(hbox{110})/langle hbox{110}rangle$ uniaxial strain; FINFETs; Hooge parameter; SiGe; flicker noise; hole mobility;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2012.2206010