Title :
Power-Rail ESD Clamp Circuit With Ultralow Standby Leakage Current and High Area Efficiency in Nanometer CMOS Technology
Author :
Yeh, Chih-Ting ; Ker, Ming-Dou
Author_Institution :
Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Abstract :
An ultralow-leakage power-rail electrostatic discharge (ESD) clamp circuit realized with only thin gate oxide devices and with silicon-controlled rectifier (SCR) as the main ESD clamp device has been proposed and verified in a 65-nm CMOS process. By reducing the voltage difference across the gate oxide of the devices in the ESD detection circuit, the proposed power-rail ESD clamp circuit can achieve an ultralow standby leakage current. In addition, the ESD-transient detection circuit can be totally embedded in the SCR device by modifying the layout structure. From the measured results, the proposed power-rail ESD clamp circuit with an SCR width of 45 μm can achieve 7-kV human-body-model and 350-V machine-model ESD levels under the ESD stress event while consuming only a standby leakage current in the order of nanoamperes at room temperature under the normal circuit operating condition with 1-V bias.
Keywords :
CMOS integrated circuits; clamps; electric sensing devices; electrostatic devices; electrostatic discharge; elemental semiconductors; leakage currents; low-power electronics; silicon; thyristors; ESD stress event; ESD-transient detection circuit; SCR; Si; human-body-model; machine-model ESD level; nanometer CMOS technology; silicon-controlled rectifier; size 45 mum; size 65 nm; temperature 293 K to 298 K; thin gate oxide device; ultralow standby leakage current; ultralow-leakage power-rail electrostatic discharge clamp circuit; voltage 1 V; voltage 350 V; voltage 7 kV; voltage difference; CMOS integrated circuits; Clamps; Electrostatic discharges; Leakage current; Logic gates; Manganese; Thyristors; gate leakage; power-rail electrostatic discharge (ESD) clamp circuit; silicon-controlled rectifier (SCR);
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2012.2209120