Title :
Optimisation of 660 nm high-power tapered diode lasers
Author :
Kaspari, C. ; Blume, Gunnar ; Feise, David ; Paschke, Katrin ; Erbert, Gotz ; Weyers, M.
Author_Institution :
LayTec AG, Berlin, Germany
fDate :
6/1/2011 12:00:00 AM
Abstract :
Tapered diode lasers in the red spectral range with nearly diffraction-limited output are prospective light sources for display applications and analytic methods such as fluorescence microscopy. The authors have studied the influence of the number of quantum wells and the lateral design of 660 nm high-power tapered diode lasers on the output power and the beam quality. From these investigations the authors have developed an optimised design and achieved a record output power of 1.5 W with a beam quality close to the diffraction limit (M2(1/e2)=1.5). The authors also demonstrate operation over 4500=h at power levels between 0.5 and 1.0=W.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; indium compounds; light diffraction; light sources; optical design techniques; optimisation; quantum well lasers; InGaP-(Al0.5Ga)InP; beam quality; diffraction-limited output; display applications; double quantum well; fluorescence microscopy; high-power tapered diode lasers; light sources; optimised design; power 0.5 W to 1.0 W; red spectral range; single quantum well; wavelength 660 nm;
Journal_Title :
Optoelectronics, IET
DOI :
10.1049/iet-opt.2010.0034