• DocumentCode
    1265285
  • Title

    Low-threshold strain-compensated InGaAs(N) (/spl lambda/ = 1.19-1.31 μm) quantum-well lasers

  • Author

    Tansu, N. ; Mawst, L.J.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Wisconsin Univ., Madison, WI, USA
  • Volume
    14
  • Issue
    4
  • fYear
    2002
  • fDate
    4/1/2002 12:00:00 AM
  • Firstpage
    444
  • Lastpage
    446
  • Abstract
    Highly strained (/spl Delta/a/a /spl sim/ 2.5%) In/sub 0.4/Ga/sub 0.6/As and In/sub 0.4/Ga/sub 0.6/As/sub 0.995/N/sub 0.005/-quantum-well (QW) active lasers utilizing strain-compensating InGaP-GaAsP buffer layers and GaAs/sub 0.85/P/sub 0.15/ barrier layers, grown by metal-organic chemical vapor deposition (MOCVD), are demonstrated with lasing emission wavelength of 1.185 and 1.307 μm, respectively. Threshold and transparency current density for the strain compensated InGaAsN QW lasers, with emission wavelength of 1.295 μm, are measured to be as low as 290 A/cm2 (L = 1500 μm) and 110 A/cm2, respectively, with characteristic temperature of T0 and T1 of 130 K and 400 K.
  • Keywords
    III-V semiconductors; MOCVD; current density; gallium arsenide; gallium compounds; indium compounds; optical fabrication; quantum well lasers; vapour phase epitaxial growth; 1.185 micron; 1.19 to 1.31 micron; 1.307 micron; 130 K; 400 K; GaAs/sub 0.85/P/sub 0.15/; GaAs/sub 0.85/P/sub 0.15/ barrier layers; In/sub 0.4/Ga/sub 0.6/As; In/sub 0.4/Ga/sub 0.6/As QW lasers; In/sub 0.4/Ga/sub 0.6/As/sub 0.995/N/sub 0.005/; In/sub 0.4/Ga/sub 0.6/As/sub 0.995/N/sub 0.005/ quantum-well active lasers; InGaAsN; InGaP-GaAsP; MOCVD; characteristic temperature; emission wavelength; lasing emission wavelength; low-threshold strain-compensated InGaAsN quantum-well lasers; metal-organic chemical vapor deposition; semiconductor lasers; strain compensated InGaAsN QW lasers; strain-compensating InGaP-GaAsP buffer layers; transparency current density; Buffer layers; Chemical lasers; Chemical vapor deposition; Current density; Current measurement; Density measurement; Gallium arsenide; MOCVD; Strain measurement; Wavelength measurement;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/68.992572
  • Filename
    992572