• DocumentCode
    1267096
  • Title

    Fabrication and Integration of Micromachined Submillimeter-Wave Circuits

  • Author

    Stanec, James R. ; Barker, N. Scott

  • Author_Institution
    Charles L. Brown Dept. of Electr. & Comput. Eng., Univ. of Virginia, Charlottesville, VA, USA
  • Volume
    21
  • Issue
    8
  • fYear
    2011
  • Firstpage
    409
  • Lastpage
    411
  • Abstract
    Micromachining techniques have been shown to have the necessary precision to fabricate accurate submillimeter-wave circuits and structures; however, few submillimeter-wave circuits created by these techniques have been integrated into existing systems. This article builds on previous lithographic micromachining techniques to fabricate and integrate geometrically complex submillimeter-wave waveguide circuits that cannot be fabricated by conventional machining, specifically a lowpass filter.
  • Keywords
    lithography; micromachining; submillimetre wave circuits; geometrically complex submillimeter-wave waveguide circuit; lithographic micromachining technique; micromachined submillimeter-wave circuit; Fabrication; Length measurement; Loss measurement; Micromachining; Rough surfaces; Silicon; Surface roughness; Bandstop; UV LIGA; filter; lowpass; micromachining; rectangular waveguide; submillimeter-wave; terahertz;
  • fLanguage
    English
  • Journal_Title
    Microwave and Wireless Components Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1531-1309
  • Type

    jour

  • DOI
    10.1109/LMWC.2011.2158411
  • Filename
    5944983