Title :
Deep-UV Technology for the Fabrication of Bragg Gratings on SOI Rib Waveguides
Author :
Giuntoni, Ivano ; Stolarek, David ; Richter, Harald ; Marschmeyer, Steffen ; Bauer, Joachim ; Gajda, Andrzej ; Bruns, Jürgen ; Tillack, Bernd ; Petermann, Klaus ; Zimmermann, Lars
Author_Institution :
Tech. Univ. Berlin, Berlin, Germany
Abstract :
In this letter, we present a wafer level technology based on deep-ultraviolet lithography to fabricate Bragg gratings on silicon-on-insulator rib waveguides. The principle of the used double-patterning technique is presented, as well the influence of the process variation on the device performances. The fabricated Bragg gratings were characterized and compared to analogue structures patterned with electron-beam lithography.
Keywords :
Bragg gratings; integrated optics; optical fabrication; optical waveguides; rib waveguides; silicon-on-insulator; ultraviolet lithography; Bragg grating fabrication; SOI rib waveguides; Si; deep-UV technology; deep-ultraviolet lithography; double-patterning technique; silicon-on-insulator rib waveguides; wafer level technology; Bragg scattering; gratings; rib waveguides; silicon-on-insulator technology; waveguide filters;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2009.2035096
