DocumentCode
1268293
Title
Rethinking deep-submicron circuit design
Author
Sylvester, Dennis ; Keutzer, Kurt
Author_Institution
Synopsys Inc., USA
Volume
32
Issue
11
fYear
1999
fDate
11/1/1999 12:00:00 AM
Firstpage
25
Lastpage
33
Abstract
Interconnect delay need not increase as CMOS process geometries shrink, and current IC design methods should suffice for modules of up to 50,000 gates. Beyond that, designers must focus on a new concept - global interconnect design. We consider the effects of both devices and interconnect, and our analysis shows that interconnect delay actually decreases for deep-submicron (DSM) processes in a modular design approach. The physical explanations of these DSM effects shed insight into this and other potential impacts on future high-performance ASIC designs
Keywords
CMOS integrated circuits; application specific integrated circuits; integrated circuit design; integrated circuit interconnections; ASIC; CMOS IC; deep submicron circuit design; global interconnect design; modular design; CMOS process; Circuit synthesis; Crosstalk; Delay; Dielectrics; Energy consumption; Geometry; Integrated circuit interconnections; Virtual manufacturing; Voltage;
fLanguage
English
Journal_Title
Computer
Publisher
ieee
ISSN
0018-9162
Type
jour
DOI
10.1109/2.803637
Filename
803637
Link To Document