DocumentCode :
1268293
Title :
Rethinking deep-submicron circuit design
Author :
Sylvester, Dennis ; Keutzer, Kurt
Author_Institution :
Synopsys Inc., USA
Volume :
32
Issue :
11
fYear :
1999
fDate :
11/1/1999 12:00:00 AM
Firstpage :
25
Lastpage :
33
Abstract :
Interconnect delay need not increase as CMOS process geometries shrink, and current IC design methods should suffice for modules of up to 50,000 gates. Beyond that, designers must focus on a new concept - global interconnect design. We consider the effects of both devices and interconnect, and our analysis shows that interconnect delay actually decreases for deep-submicron (DSM) processes in a modular design approach. The physical explanations of these DSM effects shed insight into this and other potential impacts on future high-performance ASIC designs
Keywords :
CMOS integrated circuits; application specific integrated circuits; integrated circuit design; integrated circuit interconnections; ASIC; CMOS IC; deep submicron circuit design; global interconnect design; modular design; CMOS process; Circuit synthesis; Crosstalk; Delay; Dielectrics; Energy consumption; Geometry; Integrated circuit interconnections; Virtual manufacturing; Voltage;
fLanguage :
English
Journal_Title :
Computer
Publisher :
ieee
ISSN :
0018-9162
Type :
jour
DOI :
10.1109/2.803637
Filename :
803637
Link To Document :
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