Title :
Control of charge on insulating glass in vacuum by plasma processing
Author_Institution :
Adv. Technol. R&D Center, Mitsubishi Electr. Corp., Hyogo, Japan
fDate :
4/1/2002 12:00:00 AM
Abstract :
In order to control the charging of insulating glass used in HV vacuum equipment, the effect of H2 plasma processing on the glass surface was studied. The electron-beam irradiation method was used to verify the effectiveness of the charging control. Borosilicate glass plates were used as test samples. When the glass was exposed to H2 plasma produced by ac (60 Hz) voltage application, the surface resistivity of the glass was decreased, varying with H2 plasma processing time. By exposure to H2 plasma for 20 min, the surface resistivity was reduced from ∼1017 to ∼1012 Ω. Due to the reduction of the surface resistivity, charging of the glass can be controlled to a level below that which could cause surface flashover.
Keywords :
borosilicate glasses; electron beam effects; flashover; high-voltage techniques; insulating materials; plasma materials processing; surface charging; surface conductivity; surface potential; surface treatment; vacuum apparatus; 1E12 ohm; 20 min; 60 Hz; BSG; H2; H2 plasma processing; HV vacuum equipment; SiO2-B2O3-Al2O3-Na2O-K2O-Li2O; ac voltage application; borosilicate glass plates; charging control; electrode support; electron-beam irradiation method; glass surface; insulating glass; surface flashover; surface resistivity; Conductivity; Dielectrics and electrical insulation; Electrodes; Flashover; Glass; Plasma applications; Plasma materials processing; Plasma measurements; Surface charging; Testing;
Journal_Title :
Dielectrics and Electrical Insulation, IEEE Transactions on
