DocumentCode :
1269704
Title :
Waveguided Ge/Si Avalanche Photodiode With Separate Vertical SEG-Ge Absorption, Lateral Si Charge, and Multiplication Configuration
Author :
Zhu, Shiyang ; Ang, Kah-Wee ; Rustagi, Subhash C. ; Wang, J. ; Xiong, Y.Z. ; Lo, G.Q. ; Kwong, D.L.
Author_Institution :
Inst. of Microelectron., Agency for Sci., Technol. & Res., Singapore, Singapore
Volume :
30
Issue :
9
fYear :
2009
Firstpage :
934
Lastpage :
936
Abstract :
A novel Si-waveguide-integrated Ge/Si avalanche photodiode (APD) is demonstrated for the first time, in which light propagating along the Si waveguide is evanescently absorbed by an overlaying Ge layer selectively grown on it, whereas the avalanche multiplication of photoexcited carriers occurs laterally in the Si-waveguide layer. The APD provides a responsivity of ~7.2 A/W at 1550 nm, which is ~26 times larger than the corresponding vertical Ge/Si p-i-n photodiode, and exhibits a 3-dB bandwidth of ~3.3 GHz, a dark current of ~22 ??A at 22-V bias, and an excess noise factor of ~4, respectively.
Keywords :
Ge-Si alloys; avalanche photodiodes; elemental semiconductors; light propagation; photoexcitation; Ge; Si; evanescent coupling; germanium heteroepitaxy; multiplication configuration; photoexcited carriers; vertical absorption; waveguided avalanche photodiode; Avalanche photodiode (APD); Si photonics; Si waveguide; evanescent coupling; germanium heteroepitaxy;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2009.2025782
Filename :
5184883
Link To Document :
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