DocumentCode
1273165
Title
High-Holding-Voltage Silicon-Controlled Rectifier for ESD Applications
Author
Dong, Shurong ; Wu, Jian ; Miao, Meng ; Zeng, Jie ; Han, Yan ; Liou, Juin J.
Author_Institution
Dept. of Inf. Sci. & Electron. Eng., Zhejiang Univ., Hangzhou, China
Volume
33
Issue
10
fYear
2012
Firstpage
1345
Lastpage
1347
Abstract
Low-voltage-triggering silicon-controlled rectifier (LVTSCR) having a gate structure can offer a low trigger voltage in electrostatic discharge (ESD) applications. To avoid the threat of latch-up, the lateral width of LVTSCR is often stretched to obtain a relatively high holding voltage. The resulting lateral dimension increase, however, enlarges the size of LVTSCR. In this letter, a new method to increase the holding voltage of LVTSCR is developed. It is based on adding a floating-n-well region in the LVTSCR and can increase the holding voltage without requiring additional layout area. Furthermore, with this new LVTSCR, it is possible to implement an ESD protection operation within a very small window of 1 V.
Keywords
electrostatic discharge; thyristors; ESD protection operation; LVTSCR; electrostatic discharge applications; floating-n-well region; gate structure; high-holding-voltage silicon-controlled rectifier; lateral dimension; lateral width; low-voltage-triggering silicon-controlled rectifier; voltage 1 V; Bipolar transistors; CMOS integrated circuits; CMOS process; Electrostatic discharges; Logic gates; Thyristors; Electrostatic discharge (ESD); floating n-well (FN); silicon-controlled rectifier (SCR);
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2012.2208934
Filename
6286984
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